Logo DM2

Diffusion Models for Disordered Materials

1University of California, Los Angeles
Easy, fast, and accurate
generation of atomistic structures
for disordered materials
Generation of a-SiO2

Generation of a-SiO2

Generation of a-SiO2

Generation of Cu50Zr50

Generation of a-SiO2

Generation of amorphous mesoporous silica

Introduction

Generative models show ample promise for materials design, but face severe limitations in the amorphous materials space due to their complex structures. Traditional approaches struggle to capture the intricate, non-periodic arrangements that characterize disordered materials, creating a significant gap in computational materials science.

To address this challenge, we developed Logo DM2, a denoising diffusion framework that generates reliable atomistic structures across diverse amorphous systems and processing conditions. Our approach outperforms classical simulations by up to 1000 times, representing a leap in computational efficiency while maintaining structural accuracy.

With Logo DM2, we enable a range of applications in amorphous materials research, including performing fracture simulations with large, slow-cooled structures, generating mesoporous structures, and augmenting experimental datasets with synthetic data. These capabilities open new avenues for understanding and modeling complex disordered materials.

This work provides a comprehensive roadmap on how to use, validate, and develop generative models for amorphous materials. Our framework represents bridges the gap between computational efficiency and structural fidelity in materials science, paving the way for accelerated discovery and design of disordered materials with tailored properties.

Framework

Logo DM2 employs a denoiser model trained to predict the displacement added to amorphous structures during the diffusion process. During training, displacements ε are sampled from Gaussian distributions and systematically added to the training structures, enabling the model to learn the underlying structural patterns of disordered materials. Structure-level labels such as cooling rates are embedded into the training set using a Gaussian basis set, allowing the model to generate structures conditioned on given processing parameters. To generate new structures, the model is provided with a random input structure and a target cooling rate. The structure is then denoised over multiple time steps following a carefully designed noise schedule similar to the denoising diffusion probabilistic model (DDPM) framework, progressively refining the atomic positions to produce physically realistic amorphous structures.

DM2_framwork

DM2 Framework Overview: Our denoising diffusion approach for generating amorphous structures, showing the training process with Gaussian noise addition and the iterative denoising procedure for structure generation.

Quick Generation

Step 1: Define the system size and shape.

Step 2: (optional) Choose the cooling rate.

Step 3: Define the denoising steps.

Step 4: Run and generate!

Download our denoiser models here (UNDER CONSTRUCTION).

Download our generation script here (UNDER CONSTRUCTION).

Available Models

Model Name System Conditional Condition Type Cutoff Training Data Data Contributor Download
gen-a-sio2-v1 a-SiO2 No N/A 5 Å 6×3000 atoms Kai Yang ⬇️(UNDER CONSTRUCTION)
gen-a-sio2-cond-v1 a-SiO2 Yes Cooling rate 5 Å 24×3000 atoms Kai Yang ⬇️(UNDER CONSTRUCTION)
gen-cu50zr50-v1 Cu50Zr50 No N/A 5 Å 2×5000 atoms Wang et al. ⬇️(UNDER CONSTRUCTION)

Validation

Pair Distribution Function Validation

Validation Result

Our denoising diffusion model successfully reproduces the pair distribution function g(r) characteristics of amorphous materials. The generated structures show excellent agreement with experimental and molecular dynamics reference data, capturing both short-range and medium-range structural ordering essential for realistic material properties.

Application

Application Title

Application Result

description: 'The computational cost of simulating a-SiO2 within the melt-quench process drastically increases with lower cooling rate, whereas the generative model has constant inference time. At very low cooling rates (10−2 K/ps), the difference in computational wall time can reach 3 orders of magnitude.'

BibTeX

@article{yang2025generative,
  title   ={A Generative Diffusion Model for Amorphous Materials},
  author  ={Yang, Kai and Schwalbe-Koda, Daniel},
  journal ={arXiv:2507.05024},
  year    ={2025}
}

Funding